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231223s2004 xx ||||| 00| ||eng c |
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|a pubmed24n0500.xml
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|a (DE-627)NLM149821700
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|a (NLM)15301501
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|a DE-627
|b ger
|c DE-627
|e rakwb
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|a eng
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| 100 |
1 |
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|a Tai, Y
|e verfasserin
|4 aut
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| 245 |
1 |
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|a Depth distribution of irradiation-induced cross-linking in aromatic self-assembled monolayers
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1 |
|c 2004
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| 336 |
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|a Text
|b txt
|2 rdacontent
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|a ohne Hilfsmittel zu benutzen
|b n
|2 rdamedia
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|a Band
|b nc
|2 rdacarrier
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|a Date Completed 09.06.2006
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|a Date Revised 15.11.2006
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|a published: Print
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|a Citation Status MEDLINE
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|a Pristine and strongly irradiated self-assembled monolayers of [1,1':4',1' '-terphenyl]-4,4' '-dimethanethiol (TPDMT) on Au have been characterized by near-edge X-ray absorption fine structure spectroscopy using partial electron yield acquisition mode. The TPDMT films were found to be extremely stable toward electron irradiation, which is explained by cross-linking between the aromatic backbones. In addition, we assume that a large delocalization and a strong relaxation of the initial electronic excitations in the densely packed film contributed to the film stability. The data analysis implies an inhomogeneous distribution of the irradiation-induced dehydrogenation and cross-linking of the terphenyl moieties in the TPDMT film, being most pronounced close to the film-ambient interface. The inhomogeneity was explained by quenching of the electronically excited C-H states via dipole-dipole interaction with the states' image at the metal surface, which has a reduced probability with increasing separation from the metal surface. Generally, the results suggest the importance of relaxation processes for the response of self-assembled monolayers to ionizing radiation
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|a Journal Article
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|a Research Support, Non-U.S. Gov't
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| 650 |
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|a (1,1'-4',1''-terphenyl)-4,4''-dimethanethiol
|2 NLM
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| 650 |
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|a Cross-Linking Reagents
|2 NLM
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7 |
|a Hydrocarbons, Aromatic
|2 NLM
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|a Membranes, Artificial
|2 NLM
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|a Sulfhydryl Compounds
|2 NLM
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| 650 |
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|a Terphenyl Compounds
|2 NLM
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| 650 |
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|a Gold
|2 NLM
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| 650 |
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|a 7440-57-5
|2 NLM
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| 700 |
1 |
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|a Shaporenko, A
|e verfasserin
|4 aut
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1 |
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|a Eck, W
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Grunze, M
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Zharnikov, M
|e verfasserin
|4 aut
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| 773 |
0 |
8 |
|i Enthalten in
|t Langmuir : the ACS journal of surfaces and colloids
|d 1992
|g 20(2004), 17 vom: 17. Aug., Seite 7166-70
|w (DE-627)NLM098181009
|x 1520-5827
|7 nnns
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| 773 |
1 |
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|g volume:20
|g year:2004
|g number:17
|g day:17
|g month:08
|g pages:7166-70
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|d 20
|j 2004
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|h 7166-70
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