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|a (NLM)15274598
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|e rakwb
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|a eng
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| 100 |
1 |
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|a Menard, Etienne
|e verfasserin
|4 aut
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|a Improved surface chemistries, thin film deposition techniques, and stamp designs for nanotransfer printing
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|c 2004
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|a Text
|b txt
|2 rdacontent
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|a ohne Hilfsmittel zu benutzen
|b n
|2 rdamedia
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|a Band
|b nc
|2 rdacarrier
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|a Date Completed 22.05.2006
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|a Date Revised 27.07.2004
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|a published: Print
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|a Citation Status PubMed-not-MEDLINE
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|a Nanotransfer printing represents an additive approach for patterning thin layers of solid materials with nanometer resolution. The surface chemistries, thin film deposition techniques, and stamp designs are all important for the proper operation of this method. This paper presents some details concerning processing procedures and other considerations needed for patterning two- and three-dimensional nanostructures with low density of defects and minimal distortions
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|a Journal Article
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|a Bilhaut, Lise
|e verfasserin
|4 aut
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1 |
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|a Zaumseil, Jana
|e verfasserin
|4 aut
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| 700 |
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|a Rogers, John A
|e verfasserin
|4 aut
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| 773 |
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|i Enthalten in
|t Langmuir : the ACS journal of surfaces and colloids
|d 1992
|g 20(2004), 16 vom: 03. Aug., Seite 6871-8
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|x 1520-5827
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|g volume:20
|g year:2004
|g number:16
|g day:03
|g month:08
|g pages:6871-8
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