XAFS spectra from reflectivity measurements
The reflectivity of TiSi(2) films was measured as a function of photon energy E at the Ti K-edge region at a glancing angle theta close to the critical angle theta(C) of total reflection. TiSi(2) silicide films (about 30 nm thickness) were prepared by silicidation of Ti thin films deposited on Si(00...
| Veröffentlicht in: | Journal of synchrotron radiation. - 1998. - 5(1998), Pt 3 vom: 01. Mai, Seite 1144-5 |
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| 1. Verfasser: | |
| Weitere Verfasser: | , , |
| Format: | Aufsatz |
| Sprache: | English |
| Veröffentlicht: |
1998
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| Zugriff auf das übergeordnete Werk: | Journal of synchrotron radiation |
| Schlagworte: | Journal Article |