Preparation of Ti-Si binary oxide thin film photocatalysts by the application of an ionized cluster beam method
Ti-Si binary oxide thin films with various Ti contents were prepared in a dry process by using an Ionized Cluster Beam (ICB) deposition method with multi ion sources. From the results of UV-VIS measurements, the transmittance of these binary oxide thin films is very high compared to pure TiO2 thin f...
| Veröffentlicht in: | Journal of synchrotron radiation. - 1994. - 8(2001), Pt 2 vom: 01. März, Seite 643-4 |
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| 1. Verfasser: | |
| Weitere Verfasser: | , , |
| Format: | Aufsatz |
| Sprache: | English |
| Veröffentlicht: |
2001
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| Zugriff auf das übergeordnete Werk: | Journal of synchrotron radiation |
| Schlagworte: | Journal Article |