Separation of Neighboring Terraces on a Flattened Si(111) Surface by Selective Etching along Step Edges Using Total Wet Chemical Processing

par Ma, Zhida
Publié dans: Langmuir : the ACS journal of surfaces and colloids (2022)

Highly efficient damage-free correction of thickness distribution of quartz crystal wafers by atmospheric pressure plasma etching

par Yamamura, Kazuya
Publié dans: IEEE transactions on ultrasonics, ferroelectrics, and frequency control (2009)

Image quality improvement in a hard X-ray projection microscope using total reflection mirror optics

par Mimura, Hidekazu
Publié dans: Journal of synchrotron radiation (2004)

Nearly diffraction-limited line focusing of a hard-X-ray beam with an elliptically figured mirror

par Yamauchi, Kazuto
Publié dans: Journal of synchrotron radiation (2002)