Fabrication of ordered, large scale, horizontally-aligned si nanowire arrays based on an in situ hard mask block copolymer approach

von Ghoshal, Tandra
Veröffentlicht in: Advanced materials (Deerfield Beach, Fla.) (2014)

Molecularly functionalized silicon substrates for orientation control of the microphase separation of PS-b-PMMA and PS-b-PDMS block copolymer systems

von Borah, Dipu
Veröffentlicht in: Langmuir : the ACS journal of surfaces and colloids (2013)

Study on the combined effects of solvent evaporation and polymer flow upon block copolymer self-assembly and alignment on topographic patterns

von Fitzgerald, Thomas G
Veröffentlicht in: Langmuir : the ACS journal of surfaces and colloids (2009)