Multiple Carbon Morphologies Derived from Polyion Complex-Based Double Hydrophilic Block Copolymers as Templates and Phenol as a Carbon Precursor

von Sivanantham, M
Veröffentlicht in: Langmuir : the ACS journal of surfaces and colloids (2023)

Fabrication of ordered, large scale, horizontally-aligned si nanowire arrays based on an in situ hard mask block copolymer approach

von Ghoshal, Tandra
Veröffentlicht in: Advanced materials (Deerfield Beach, Fla.) (2014)

Tuning PDMS brush chemistry by UV-O3 exposure for PS-b-PDMS microphase separation and directed self-assembly

von Borah, Dipu
Veröffentlicht in: Langmuir : the ACS journal of surfaces and colloids (2013)