High-Throughput Area-Selective Spatial Atomic Layer Deposition of SiO2 with Interleaved Small Molecule Inhibitors and Integrated Back-Etch Correction for Low Defectivity

par Karasulu, Bora
Publié dans: Advanced materials (Deerfield Beach, Fla.) (2023)

Area-Selective Atomic Layer Deposition of In2O3:H Using a μ-Plasma Printer for Local Area Activation

par Mameli, Alfredo
Publié dans: Chemistry of materials : a publication of the American Chemical Society (2017)

Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization

par Vervuurt, René H J
Publié dans: Chemistry of materials : a publication of the American Chemical Society (2017)