Recent Progress in Simple and Cost-Effective Top-Down Lithography for ≈10 nm Scale Nanopatterns From Edge Lithography to Secondary Sputtering Lithography

von Jung, Woo-Bin
Veröffentlicht in: Advanced materials (Deerfield Beach, Fla.) (2020)

An Ultrastable Ionic Chemiresistor Skin with an Intrinsically Stretchable Polymer Electrolyte

von Jin, Ming Liang
Veröffentlicht in: Advanced materials (Deerfield Beach, Fla.) (2018)