Pseudotunnel Magnetoresistance in Twisted van der Waals Fe3GeTe2 Homojunctions
© 2025 Wiley‐VCH GmbH.
| Publié dans: | Advanced materials (Deerfield Beach, Fla.). - 1998. - 37(2025), 8 vom: 04. Feb., Seite e2411459 |
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| Auteur principal: | |
| Autres auteurs: | , , , , , , , , , , , , , , |
| Format: | Article en ligne |
| Langue: | English |
| Publié: |
2025
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| Accès à la collection: | Advanced materials (Deerfield Beach, Fla.) |
| Sujets: | Journal Article large angle twistronics lattice mismatch magnetic thin layers magnetic tunnel junctions van der Waals gaps |
| Résumé: | © 2025 Wiley‐VCH GmbH. Twistronics, a novel engineering approach involving the alignment of van der Waals (vdW) integrated two-dimensional materials at specific angles, has recently attracted significant attention. Novel nontrivial phenomena have been demonstrated in twisted vdW junctions (the so-called magic angle), such as unconventional superconductivity, topological phases, and magnetism. However, there have been only few reports on integrated vdW layers with large twist angles θt, such as twisted interfacial Josephson junctions using high-temperature superconductors. Herein, vdW homojunctions of the thin-magnetic flakes, Fe3GeTe2 (FGT), with large θt ranging from 0° to 90°, without inserting any tunnel barriers are assembled. Nevertheless, these vdW homojunctions exhibit tunnel-magnetoresistance (TMR) like behavior (pseudo-TMR (PTMR) effect) with the ratios highly sensitive to the θt values, revealing that the vdW gap at the junction interface between the twisted FGT layers behaves like a tunnel barrier and the θt serves a control parameter for PTMR by drastically varying magnitudes of the lattice-mismatch and the subsequent appearance of antiferromagnetic (AFM) spin alignment. First-principles calculations considering vacuum gaps indicate strong dependence of TMR on the θt driven by the sixfold screw rotational symmetry of bulk FGT. The present homojunctions hold promise as a platform for novel AFM spin-dependent phenomena and spintronic applications |
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| Description: | Date Revised 25.02.2025 published: Print-Electronic Citation Status PubMed-not-MEDLINE |
| ISSN: | 1521-4095 |
| DOI: | 10.1002/adma.202411459 |