Lee, J., Park, H., Jin, K., Kim, J. S., Cheong, S., & Yeom, H. (2024). Topological Complex Charge Conservation in Nontrivial Z2 × Z2 Domain Walls. Advanced materials (Deerfield Beach, Fla.), 36(25), . https://doi.org/10.1002/adma.202313803
Chicago ZitierstilLee, Jhinhwan, Hae-Ryong Park, Kyung-Hwan Jin, Jun Sung Kim, Sang-Wook Cheong, und Han-Woong Yeom. "Topological Complex Charge Conservation in Nontrivial Z2 × Z2 Domain Walls." Advanced Materials (Deerfield Beach, Fla.) 36, no. 25 (2024). https://dx.doi.org/10.1002/adma.202313803.
MLA ZitierstilLee, Jhinhwan, et al. "Topological Complex Charge Conservation in Nontrivial Z2 × Z2 Domain Walls." Advanced Materials (Deerfield Beach, Fla.), vol. 36, no. 25, 2024.
Achtung: Diese Zitate sind unter Umständen nicht zu 100% korrekt.