Lee, J., Park, H., Jin, K., Kim, J. S., Cheong, S., & Yeom, H. (2024). Topological Complex Charge Conservation in Nontrivial Z2 × Z2 Domain Walls. Advanced materials (Deerfield Beach, Fla.), 36(25), . https://doi.org/10.1002/adma.202313803
Style de citation ChicagoLee, Jhinhwan, Hae-Ryong Park, Kyung-Hwan Jin, Jun Sung Kim, Sang-Wook Cheong, et Han-Woong Yeom. "Topological Complex Charge Conservation in Nontrivial Z2 × Z2 Domain Walls." Advanced Materials (Deerfield Beach, Fla.) 36, no. 25 (2024). https://dx.doi.org/10.1002/adma.202313803.
Style de citation MLALee, Jhinhwan, et al. "Topological Complex Charge Conservation in Nontrivial Z2 × Z2 Domain Walls." Advanced Materials (Deerfield Beach, Fla.), vol. 36, no. 25, 2024.
Attention : ces citations peuvent ne pas être correctes à 100%.