van Campenhout, C. T., Schoenmaker, H., van Hecke, M., & Noorduin, W. L. (2023). Patterning Complex Line Motifs in Thin Films Using Immersion-Controlled Reaction-Diffusion. Advanced materials (Deerfield Beach, Fla.), 35(39), . https://doi.org/10.1002/adma.202305191
Style de citation Chicagovan Campenhout, Christiaan T., Hinco Schoenmaker, Martin van Hecke, et Willem L. Noorduin. "Patterning Complex Line Motifs in Thin Films Using Immersion-Controlled Reaction-Diffusion." Advanced Materials (Deerfield Beach, Fla.) 35, no. 39 (2023). https://dx.doi.org/10.1002/adma.202305191.
Style de citation MLAvan Campenhout, Christiaan T., et al. "Patterning Complex Line Motifs in Thin Films Using Immersion-Controlled Reaction-Diffusion." Advanced Materials (Deerfield Beach, Fla.), vol. 35, no. 39, 2023.