APA Zitierstil

Yang, S., Liu, K., Xu, Y., Liu, L., Li, H., & Zhai, T. (2023). Gate Dielectrics Integration for 2D Electronics: Challenges, Advances, and Outlook. Advanced materials (Deerfield Beach, Fla.), 35(18), . https://doi.org/10.1002/adma.202207901

Chicago Zitierstil

Yang, Sijie, Kailang Liu, Yongshan Xu, Lixin Liu, Huiqiao Li, und Tianyou Zhai. "Gate Dielectrics Integration for 2D Electronics: Challenges, Advances, and Outlook." Advanced Materials (Deerfield Beach, Fla.) 35, no. 18 (2023). https://dx.doi.org/10.1002/adma.202207901.

MLA Zitierstil

Yang, Sijie, et al. "Gate Dielectrics Integration for 2D Electronics: Challenges, Advances, and Outlook." Advanced Materials (Deerfield Beach, Fla.), vol. 35, no. 18, 2023.