The Modulation of Electrokinetic Streaming Potentials of Silicon-Based Surfaces through Plasma-Based Surface Processing

A new plasma processing-based methodology for enhancing the streaming potential (Vs) that may be obtained in electrokinetic flows for a given pressure gradient over a silicon surface-based microchannel is indicated. The dependence of the Vs on both the surface zeta potential and the electrolyte slip...

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Publié dans:Langmuir : the ACS journal of surfaces and colloids. - 1985. - 38(2022), 39 vom: 04. Okt., Seite 11837-11844
Auteur principal: Cheng, Li (Auteur)
Autres auteurs: Fan, Bei, Zhang, Zichen, McLeod, Aaron, Shipley, Wade, Bandaru, Prabhakar
Format: Article en ligne
Langue:English
Publié: 2022
Accès à la collection:Langmuir : the ACS journal of surfaces and colloids
Sujets:Journal Article