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231225s2021 xx |||||o 00| ||eng c |
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|a 10.1002/adma.202100775
|2 doi
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|a pubmed25n1084.xml
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|a (DE-627)NLM325392366
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|a (NLM)33987871
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|a DE-627
|b ger
|c DE-627
|e rakwb
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|a eng
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| 100 |
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|a Liu, Wei
|e verfasserin
|4 aut
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|a Imaging and Controlling Photonic Modes in Perovskite Microcavities
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|c 2021
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|a Text
|b txt
|2 rdacontent
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|a ƒaComputermedien
|b c
|2 rdamedia
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|a ƒa Online-Ressource
|b cr
|2 rdacarrier
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|a Date Revised 22.06.2021
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|a published: Print-Electronic
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|a Citation Status PubMed-not-MEDLINE
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|a © 2021 Wiley-VCH GmbH.
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|a Perovskite microcavities have excellent photophysical properties for integrated optoelectronic devices, such as nanolasers. Imaging and controlling the photonic modes within the cavity are fundamentally important to understand and develop applications. Here, photoemission electron microscopy (PEEM) is used to image the photonic modes within optical microcavities with a nanometer-scale spatial resolution. From a CsPbBr3 microcavity, hybrid mode patterns are observed. Spatial frequency spectrum analysis on the patterns uncovers the characteristic cavity modes, which are modeled with transverse magnetic (TM) and transverse electric (TE) waves, and assigned to exciton-polariton modes. Based on this understanding, the light focus in a designed microcavity is imaged in real space and controlled by the light field polarization. The study confirms that the cavity modes in perovskites can be effectively observed by the PEEM technique under resonant excitation, which, in turn, promotes the design of optoelectronic devices based on perovskite microcavities
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|a Journal Article
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|a exciton-polariton
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4 |
|a microcavity
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|a perovskite lasers
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|a perovskite microcavities
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|a photonic modes
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|a Li, Yaolong
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Yu, Haoran
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Wang, Ju
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Hu, Aiqin
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Jia, Shangtong
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Li, Xiaofang
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Yang, Hong
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Dai, Lun
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Lu, Guowei
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Liu, Yunquan
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Wang, Shufeng
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Gong, Qihuang
|e verfasserin
|4 aut
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| 773 |
0 |
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|i Enthalten in
|t Advanced materials (Deerfield Beach, Fla.)
|d 1998
|g 33(2021), 25 vom: 30. Juni, Seite e2100775
|w (DE-627)NLM098206397
|x 1521-4095
|7 nnas
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| 773 |
1 |
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|g volume:33
|g year:2021
|g number:25
|g day:30
|g month:06
|g pages:e2100775
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|u http://dx.doi.org/10.1002/adma.202100775
|3 Volltext
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