APA Zitierstil

Li, X., Fan, W., Xu, D., Ding, J., Bai, H., & Shi, W. (2020). Boosted Photoelectrochemical N2 Reduction over Mo2C In Situ Coated with Graphitized Carbon. Langmuir : the ACS journal of surfaces and colloids, 36(48), 14802. https://doi.org/10.1021/acs.langmuir.0c02770

Chicago Zitierstil

Li, Xia, Weiqiang Fan, Dongbo Xu, Jinrui Ding, Hongye Bai, und Weidong Shi. "Boosted Photoelectrochemical N2 Reduction over Mo2C In Situ Coated with Graphitized Carbon." Langmuir : The ACS Journal of Surfaces and Colloids 36, no. 48 (2020): 14802. https://dx.doi.org/10.1021/acs.langmuir.0c02770.

MLA Zitierstil

Li, Xia, et al. "Boosted Photoelectrochemical N2 Reduction over Mo2C In Situ Coated with Graphitized Carbon." Langmuir : The ACS Journal of Surfaces and Colloids, vol. 36, no. 48, 2020, p. 14802.