Niederhausen, J., MacQueen, R. W., Lips, K., Aldahhak, H., Schmidt, W. G., & Gerstmann, U. (2020). Tetracene Ultrathin Film Growth on Hydrogen-Passivated Silicon. Langmuir : the ACS journal of surfaces and colloids, 36(31), 9099. https://doi.org/10.1021/acs.langmuir.0c01154
Style de citation ChicagoNiederhausen, Jens, Rowan W. MacQueen, Klaus Lips, Hazem Aldahhak, Wolf Gero Schmidt, et Uwe Gerstmann. "Tetracene Ultrathin Film Growth on Hydrogen-Passivated Silicon." Langmuir : The ACS Journal of Surfaces and Colloids 36, no. 31 (2020): 9099. https://dx.doi.org/10.1021/acs.langmuir.0c01154.
Style de citation MLANiederhausen, Jens, et al. "Tetracene Ultrathin Film Growth on Hydrogen-Passivated Silicon." Langmuir : The ACS Journal of Surfaces and Colloids, vol. 36, no. 31, 2020, p. 9099.