Park, H. W., Roh, J., Lee, Y. B., & Hwang, C. S. (2019). Modeling of Negative Capacitance in Ferroelectric Thin Films. Advanced materials (Deerfield Beach, Fla.), 31(32), . https://doi.org/10.1002/adma.201805266
Chicago ZitierstilPark, Hyeon Woo, Jangho Roh, Yong Bin Lee, und Cheol Seong Hwang. "Modeling of Negative Capacitance in Ferroelectric Thin Films." Advanced Materials (Deerfield Beach, Fla.) 31, no. 32 (2019). https://dx.doi.org/10.1002/adma.201805266.
MLA ZitierstilPark, Hyeon Woo, et al. "Modeling of Negative Capacitance in Ferroelectric Thin Films." Advanced Materials (Deerfield Beach, Fla.), vol. 31, no. 32, 2019.
Achtung: Diese Zitate sind unter Umständen nicht zu 100% korrekt.