Style de citation APA

Park, H. W., Roh, J., Lee, Y. B., & Hwang, C. S. (2019). Modeling of Negative Capacitance in Ferroelectric Thin Films. Advanced materials (Deerfield Beach, Fla.), 31(32), . https://doi.org/10.1002/adma.201805266

Style de citation Chicago

Park, Hyeon Woo, Jangho Roh, Yong Bin Lee, et Cheol Seong Hwang. "Modeling of Negative Capacitance in Ferroelectric Thin Films." Advanced Materials (Deerfield Beach, Fla.) 31, no. 32 (2019). https://dx.doi.org/10.1002/adma.201805266.

Style de citation MLA

Park, Hyeon Woo, et al. "Modeling of Negative Capacitance in Ferroelectric Thin Films." Advanced Materials (Deerfield Beach, Fla.), vol. 31, no. 32, 2019.