APA Zitierstil

Vijayamohanan, H., Bhide, P., Boyd, D., Zhou, Z., Palermo, E. F., & Ullal, C. K. (2019). Effect of Chemical Microenvironment in Spirothiopyran Monolayer Direct-Write Photoresists. Langmuir : the ACS journal of surfaces and colloids, 35(11), 3871. https://doi.org/10.1021/acs.langmuir.8b03304

Chicago Zitierstil

Vijayamohanan, Harikrishnan, Parth Bhide, Dante Boyd, Zhe Zhou, Edmund F. Palermo, und Chaitanya K. Ullal. "Effect of Chemical Microenvironment in Spirothiopyran Monolayer Direct-Write Photoresists." Langmuir : The ACS Journal of Surfaces and Colloids 35, no. 11 (2019): 3871. https://dx.doi.org/10.1021/acs.langmuir.8b03304.

MLA Zitierstil

Vijayamohanan, Harikrishnan, et al. "Effect of Chemical Microenvironment in Spirothiopyran Monolayer Direct-Write Photoresists." Langmuir : The ACS Journal of Surfaces and Colloids, vol. 35, no. 11, 2019, p. 3871.