Radical Initiated Hydrosilylation on Silicon Nanocrystal Surfaces : An Evaluation of Functional Group Tolerance and Mechanistic Study
Hydrosilylation is among the most common methods used for modifying silicon surface chemistry. It provides a wide range of surface functionalities and effective passivation of surface sites. Herein, we report a systematic study of radical initiated hydrosilylation of silicon nanocrystal (SiNC) surfa...
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Bibliographische Detailangaben
| Veröffentlicht in: | Langmuir : the ACS journal of surfaces and colloids. - 1985. - 31(2015), 38 vom: 29. Sept., Seite 10540-8
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| 1. Verfasser: |
Yang, Zhenyu
(VerfasserIn) |
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| Weitere Verfasser: |
Gonzalez, Christina M,
Purkait, Tapas K,
Iqbal, Muhammad,
Meldrum, Al,
Veinot, Jonathan G C |
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| Format: | Online-Aufsatz
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| Sprache: | English |
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| Veröffentlicht: |
2015
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| Zugriff auf das übergeordnete Werk: | Langmuir : the ACS journal of surfaces and colloids
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| Schlagworte: | Journal Article |
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