Sub-10 nm features obtained from directed self-assembly of semicrystalline polycarbosilane-based block copolymer thin films

Sub-10 nm features obtained from directed self-assembly of semicrystalline polycarbosilane-based block copolymer thin films

© 2014 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Détails bibliographiques
Publié dans:Advanced materials (Deerfield Beach, Fla.). - 1998. - 27(2015), 2 vom: 14. Jan., Seite 261-5
Auteur principal: Aissou, Karim (Auteur)
Autres auteurs: Mumtaz, Muhammad, Fleury, Guillaume, Portale, Giuseppe, Navarro, Christophe, Cloutet, Eric, Brochon, Cyril, Ross, Caroline A, Hadziioannou, Georges
Format: Article en ligne
Langue:English
Publié: 2015
Accès à la collection:Advanced materials (Deerfield Beach, Fla.)
Sujets:Journal Article anionic polymerization block copolymer crystallization directed self-assembly long-range order
Description
Résumé:© 2014 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
Highly-ordered arrays with sub-10 nm features are produced with topographical-directed self-assembly of low-molecular-weight poly(1,1-dimethyl silacyclobutane)-block-poly(methyl methacrylate). This system turns out to be of high interest for lithographic applications since the domain orientation is solely controlled through the polymer layer thickness, while the promotion of the microphase separation is obtained by a short thermal annealing process under mild conditions
Description:Date Completed 21.05.2015
Date Revised 01.10.2020
published: Print-Electronic
Citation Status PubMed-not-MEDLINE
ISSN:1521-4095
DOI:10.1002/adma.201404077