Tailoring SU-8 surfaces : covalent attachment of polymers by means of nitrene insertion

The photoresist material SU-8 has found a variety of applications in microfabricated systems, such as microelectromechanical (MEMS) and lab-on-a-chip devices. Although the bulk properties of SU-8 are appropriate for many such applications, tailoring its surface-chemical properties has, until now, pr...

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Publié dans:	Langmuir : the ACS journal of surfaces and colloids. - 1985. - 30(2014), 33 vom: 26. Aug., Seite 10107-11
Auteur principal:	Nagaiyanallur, Venkataraman V (Auteur)
Autres auteurs:	Kumar, Deepak, Rossi, Antonella, Zürcher, Stefan, Spencer, Nicholas D
Format:	Article en ligne
Langue:	English
Publié:	2014
Accès à la collection:	Langmuir : the ACS journal of surfaces and colloids
Sujets:	Journal Article