Yoon, J. H., Han, J. H., Jung, J. S., Jeon, W., Kim, G. H., Song, S. J., . . . Hwang, C. S. (2013). Highly improved uniformity in the resistive switching parameters of TiO2 thin films by inserting Ru nanodots. Advanced materials (Deerfield Beach, Fla.), 25(14), 1987. https://doi.org/10.1002/adma.201204572
Chicago ZitierstilYoon, Jung Ho, et al. "Highly Improved Uniformity in the Resistive Switching Parameters of TiO2 Thin Films by Inserting Ru Nanodots." Advanced Materials (Deerfield Beach, Fla.) 25, no. 14 (2013): 1987. https://dx.doi.org/10.1002/adma.201204572.
MLA ZitierstilYoon, Jung Ho, et al. "Highly Improved Uniformity in the Resistive Switching Parameters of TiO2 Thin Films by Inserting Ru Nanodots." Advanced Materials (Deerfield Beach, Fla.), vol. 25, no. 14, 2013, p. 1987.