Neutron reflectivity characterization of the photoacid reaction-diffusion latent and developed images of molecular resists for extreme ultraviolet lithography
Lithographic feature size requirements have approached a few radius of gyration of photoresist polymers used in thin-film patterning. Furthermore, the feature dimensions are commensurate with the photoacid diffusion length that defines the underlying latent image. Smaller imaging building blocks may...
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Bibliographische Detailangaben
| Veröffentlicht in: | Langmuir : the ACS journal of surfaces and colloids. - 1992. - 28(2012), 20 vom: 22. Mai, Seite 7665-78
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| 1. Verfasser: |
Prabhu, Vivek M
(VerfasserIn) |
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| Weitere Verfasser: |
Kang, Shuhui,
Sha, Jing,
Bonnesen, Peter V,
Satija, Sushil,
Wu, Wen-li,
Ober, Christopher K |
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| Format: | Online-Aufsatz
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| Sprache: | English |
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| Veröffentlicht: |
2012
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| Zugriff auf das übergeordnete Werk: | Langmuir : the ACS journal of surfaces and colloids
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| Schlagworte: | Journal Article |
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