Xu, J., Hong, S. W., Gu, W., Lee, K. Y., Kuo, D. S., Xiao, S., & Russell, T. P. (2011). Fabrication of silicon oxide nanodots with an areal density beyond 1 teradots inch(-2). Advanced materials (Deerfield Beach, Fla.), 23(48), 5755. https://doi.org/10.1002/adma.201102964
Chicago ZitierstilXu, Ji, Sung Woo Hong, Weiyin Gu, Kim Y. Lee, David S. Kuo, Shuaigang Xiao, und Thomas P. Russell. "Fabrication of Silicon Oxide Nanodots with an Areal Density Beyond 1 Teradots Inch(-2)." Advanced Materials (Deerfield Beach, Fla.) 23, no. 48 (2011): 5755. https://dx.doi.org/10.1002/adma.201102964.
MLA ZitierstilXu, Ji, et al. "Fabrication of Silicon Oxide Nanodots with an Areal Density Beyond 1 Teradots Inch(-2)." Advanced Materials (Deerfield Beach, Fla.), vol. 23, no. 48, 2011, p. 5755.