Photo-pens : a simple and versatile tool for maskless photolithography

We demonstrate conical pores etched in tracked glass chips for fabricating patterns at the micrometer scale. Highly fluorescent patterns based on photopolymerization of diacetylene films were formed by irradiating UV light through conical pores called "photo-pens". The properties of photop...

Ausführliche Beschreibung

Bibliographische Detailangaben
Veröffentlicht in:Langmuir : the ACS journal of surfaces and colloids. - 1985. - 26(2010), 22 vom: 16. Nov., Seite 17726-32
1. Verfasser: Zhou, Chuanhong (VerfasserIn)
Weitere Verfasser: Rajasekaran, Pradeep Ramiah, Wolff, Justin, Li, Xuelian, Kohli, Punit
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2010
Zugriff auf das übergeordnete Werk:Langmuir : the ACS journal of surfaces and colloids
Schlagworte:Journal Article Research Support, N.I.H., Extramural Research Support, U.S. Gov't, Non-P.H.S.
Beschreibung
Zusammenfassung:We demonstrate conical pores etched in tracked glass chips for fabricating patterns at the micrometer scale. Highly fluorescent patterns based on photopolymerization of diacetylene films were formed by irradiating UV light through conical pores called "photo-pens". The properties of photopens were investigated through experiments, finite-difference-time-domain (FDTD) simulations and numerical calculations based on Fresnel equations. We show that the pattern dimensions are easily controlled by adjusting the exposure time. Thus, patterns with a range of dimensions can be fabricated without any need of changes in the pore diameter. Parallel patterning was also demonstrated by simultaneously exposing the films to photons through multiple pores in the chip. Our method provides an inexpensive, versatile, and efficient way for patterning without the use of sophisticated masks
Beschreibung:Date Completed 04.03.2011
Date Revised 11.05.2024
published: Print-Electronic
Citation Status MEDLINE
ISSN:1520-5827
DOI:10.1021/la1028433