APA Zitierstil

Li, Y., Wang, G., Zhu, X., Liu, M., Ye, C., Chen, X., . . . Xue, Q. (2010). Intrinsic topological insulator Bi2Te3 thin films on Si and their thickness limit. Advanced materials (Deerfield Beach, Fla.), 22(36), 4002. https://doi.org/10.1002/adma.201000368

Chicago Zitierstil

Li, Yao-Yi, et al. "Intrinsic Topological Insulator Bi2Te3 Thin Films on Si and Their Thickness Limit." Advanced Materials (Deerfield Beach, Fla.) 22, no. 36 (2010): 4002. https://dx.doi.org/10.1002/adma.201000368.

MLA Zitierstil

Li, Yao-Yi, et al. "Intrinsic Topological Insulator Bi2Te3 Thin Films on Si and Their Thickness Limit." Advanced Materials (Deerfield Beach, Fla.), vol. 22, no. 36, 2010, p. 4002.