Style de citation APA

Kataoka, S., Takeuchi, Y., & Endo, A. (2010). Nanometer-sized domains in Langmuir-Blodgett films for patterning SiO2. Langmuir : the ACS journal of surfaces and colloids, 26(9), 6161. https://doi.org/10.1021/la100998h

Style de citation Chicago

Kataoka, Sho, Yasutaka Takeuchi, et Akira Endo. "Nanometer-sized Domains in Langmuir-Blodgett Films for Patterning SiO2." Langmuir : The ACS Journal of Surfaces and Colloids 26, no. 9 (2010): 6161. https://dx.doi.org/10.1021/la100998h.

Style de citation MLA

Kataoka, Sho, et al. "Nanometer-sized Domains in Langmuir-Blodgett Films for Patterning SiO2." Langmuir : The ACS Journal of Surfaces and Colloids, vol. 26, no. 9, 2010, p. 6161.