Mishra, G., Easton, C. D., & McArthur, S. L. (2010). Physical vs photolithographic patterning of plasma polymers: An investigation by ToF-SSIMS and multivariate analysis. Langmuir : the ACS journal of surfaces and colloids, 26(5), 3720. https://doi.org/10.1021/la902930z
Style de citation ChicagoMishra, Gautam, Christopher D. Easton, et Sally L. McArthur. "Physical Vs Photolithographic Patterning of Plasma Polymers: An Investigation by ToF-SSIMS and Multivariate Analysis." Langmuir : The ACS Journal of Surfaces and Colloids 26, no. 5 (2010): 3720. https://dx.doi.org/10.1021/la902930z.
Style de citation MLAMishra, Gautam, et al. "Physical Vs Photolithographic Patterning of Plasma Polymers: An Investigation by ToF-SSIMS and Multivariate Analysis." Langmuir : The ACS Journal of Surfaces and Colloids, vol. 26, no. 5, 2010, p. 3720.