Tuning curvature in flow lithography : a new class of concave/convex particles

Polymeric particles of complex shapes and chemistry have been used for a wide variety of applications in the materials and bioengineering fields. An interesting means of introducing complexity is through curvature. In this work, stop-flow lithography is used to generate concave/convex particles at h...

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Veröffentlicht in:Langmuir : the ACS journal of surfaces and colloids. - 1985. - 25(2009), 10 vom: 19. Mai, Seite 5986-92
1. Verfasser: Panda, Priyadarshi (VerfasserIn)
Weitere Verfasser: Yuet, Kai P, Hatton, T Alan, Doyle, Patrick S
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2009
Zugriff auf das übergeordnete Werk:Langmuir : the ACS journal of surfaces and colloids
Schlagworte:Journal Article Acrylates poly(ethylene glycol)diacrylate Polyethylene Glycols 3WJQ0SDW1A trimethylolpropane triacrylate 4B67KGL96S
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520 |a Polymeric particles of complex shapes and chemistry have been used for a wide variety of applications in the materials and bioengineering fields. An interesting means of introducing complexity is through curvature. In this work, stop-flow lithography is used to generate concave/convex particles at high throughputs of 3x10(4) particles/h. These particles have finely tuned curvature in the plane orthogonal to the plane of projection of light. The shape in the plane of projection of light is determined by the mask shape. The chemical programmability of this technique is further demonstrated by creating multifunctional particles, i.e., patchy and capped particles. The directed assembly of these particles can find potential application in a variety of fields like biology, photonics, and liquid crystals 
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650 7 |a poly(ethylene glycol)diacrylate  |2 NLM 
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700 1 |a Hatton, T Alan  |e verfasserin  |4 aut 
700 1 |a Doyle, Patrick S  |e verfasserin  |4 aut 
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