Marquestaut, N., Martin, A., Talaga, D., Servant, L., Ravaine, S., Reculusa, S., . . . Lagugné-Labarthet, F. (2008). Raman enhancement of azobenzene monolayers on substrates prepared by Langmuir-Blodgett deposition and electron-beam lithography techniques. Langmuir : the ACS journal of surfaces and colloids, 24(19), 11313. https://doi.org/10.1021/la801697u
Chicago ZitierstilMarquestaut, Nicolas, Amanda Martin, David Talaga, Laurent Servant, Serge Ravaine, Stéphane Reculusa, Dario M. Bassani, Elizabeth Gillies, und François Lagugné-Labarthet. "Raman Enhancement of Azobenzene Monolayers on Substrates Prepared by Langmuir-Blodgett Deposition and Electron-beam Lithography Techniques." Langmuir : The ACS Journal of Surfaces and Colloids 24, no. 19 (2008): 11313. https://dx.doi.org/10.1021/la801697u.
MLA ZitierstilMarquestaut, Nicolas, et al. "Raman Enhancement of Azobenzene Monolayers on Substrates Prepared by Langmuir-Blodgett Deposition and Electron-beam Lithography Techniques." Langmuir : The ACS Journal of Surfaces and Colloids, vol. 24, no. 19, 2008, p. 11313.