APA Zitierstil

Millaruelo, M., Eng, L. M., Mertig, M., Pilch, B., Oertel, U., Opitz, J., . . . Voit, B. (2006). Photolabile carboxylic acid protected terpolymers for surface patterning. Part 2: Photocleavage and film patterning. Langmuir : the ACS journal of surfaces and colloids, 22(22), 9446.

Chicago Zitierstil

Millaruelo, M., L M. Eng, M. Mertig, B. Pilch, U. Oertel, J. Opitz, B. Sieczkowska, F. Simon, und B. Voit. "Photolabile Carboxylic Acid Protected Terpolymers for Surface Patterning. Part 2: Photocleavage and Film Patterning." Langmuir : The ACS Journal of Surfaces and Colloids 22, no. 22 (2006): 9446.

MLA Zitierstil

Millaruelo, M., et al. "Photolabile Carboxylic Acid Protected Terpolymers for Surface Patterning. Part 2: Photocleavage and Film Patterning." Langmuir : The ACS Journal of Surfaces and Colloids, vol. 22, no. 22, 2006, p. 9446.