Re-examination of the Aqueous Stability of Atomic Layer Deposited (ALD) Amorphous Alumina (Al2O3) Thin Films and the Use of a Postdeposition Air Plasma Anneal to Enhance Stability

von Willis, Simon A
Veröffentlicht in: Langmuir : the ACS journal of surfaces and colloids (2021)

Single-Cycle Atomic Layer Deposition on Bulk Wood Lumber for Managing Moisture Content, Mold Growth, and Thermal Conductivity

von Gregory, Shawn A
Veröffentlicht in: Langmuir : the ACS journal of surfaces and colloids (2020)